Name: Nanoimprint Lithography Tool - EITRE® Large Substrates
Brand: Obducat
SKU: S4ASKWUZ
Availability: InStock

Obducat Nanoimprint Lithography Tool - EITRE® Large Substrates - Labindia

Nanoimprint Lithography Tool - EITRE® Large Substrates

S4ASKWUZ

Brand: Obducat

Category: Lithography Tools

Industry: Material Science & Chemistry, Semiconductors

Nanoimprint tool for substrates up to 500 x 500 mm. This semi-automated tool enables high accuracy patterns with resolutions down to 50 nm to be replicated large substrates with excellent repeatability . The tool offers the highest possible flexibility using different imprint processes in the same equipment, allowing a wide range of materials to be used.

Request Quote

EITRE® Large Substrates Foundry Services provide advanced nanoimprint lithography (NIL) for large‑area substrates up to 500 × 500 mm, enabling high‑accuracy pattern replication with resolutions down to the sub‑50 nm range. Powered by Obducat’s semi‑automated EITRE® Large Substrates platform, the service combines flexibility, precision, and repeatability for both research and pilot‑to‑volume production.

The EITRE® Large Substrates tool supports multiple imprint processes within the same system, including hot embossing, thermal NIL, UV‑based NIL, and Obducat’s patented Simultaneous Thermal and UV (STU®) process. This versatility allows the use of a wide range of imprint materials and enables process optimization for diverse application demands.

The EITRE^® Large Substrates NIL tool is a semi-automated lithography tool, enabling high accuracy and repeatable pattern replication down to sub 50 nm resolution.
The EITRE^® tool is particularly versatile because of the flexibility inherent in the system allowing different imprint processes to be used. The imprint processes include hot embossing, thermal NIL, UV NIL and Obducat’s patented Simultaneous Thermal and UV (STU^®) process. The Eitre^® tools can perform a range of imprint processes which enables the use of a wide range of imprint materials.
The embedded SoftPress^® technology ensures a uniform pattern replication over the whole substrate area in process step with excellent imprint quality. It guarantees the thinnest and most uniform residual layer over the entire substrate, enabling precise and simple downstream processing.
The EITRE^® tool is suitable for use in R&D as well as pilot production within application areas such as Micro- and Mini LED displays, LCD displays, optical devices, medical devices, security printing, solar cells, functional surfaces and others.
In-line CVD anti-stick of IPS enabling higher yield and reducing material compatibility issues enabling a wider process window.
Designed according to European safety regulations and CE Mark.

Obducat Nanoimprint Lithography Tool - EITRE® Large Substrates - Labindia

Nanoimprint Lithography Tool - EITRE® Large Substrates

Related Products

Explore our latest blogs on science, technology and innovation.

Obducat Nanoimprint Lithography Tool - EITRE® Large Substrates - Labindia

Nanoimprint Lithography Tool - EITRE® Large Substrates

Related Products

Agilent SureScan Microarray Scanner

Linkam CCR1000 Catalyst Cell Reactor

Constant Systems - One Shot (OS) Cell Disruptor

Constant Systems - Multi Cycle (MC) Cell Disruptor

Constant Systems - Continuous Flow (CF1 & CF2) Cell Disruptor

Constant Systems - High Flow Rate (HFR) Cell Disruptor

Restek GC Capillary Columns

Sakura Cyto-Tek® 2500 Cytocentrifuge

Sakura Tissue-Tek Prisma® Plus, and Tissue-Tek Film®

Restek HPLC & UHPLC Analytical Columns

Buchi Rotavapor® R-300

Buchi PrepPure HPLC Columns

Access Download

Thank you for your interest.

Requesting Document

Explore our latest blogs on science, technology and innovation.

Cookie Preferences