Nanoimprint Lithography Tools | Obducat | Labindia Instruments

The EITRE® 3 / 6 / 8 from Obducat is a versatile, semi‑automated Nanoimprint Lithography (NIL) platform designed for research and development environments requiring precise replication of micro‑ and nano‑scale structures. Supporting substrates up to 8” × 8”, the system offers an affordable and flexible entry into high‑resolution nanoimprinting without compromising performance or process control.

Powered by Obducat’s proprietary SoftPress® technology, the EITRE® series ensures uniform imprint pressure across the entire substrate, resulting in a thin and highly uniform residual layer—a critical factor for accurate pattern transfer, high resolution, and reliable downstream processing. The system accommodates a wide range of imprint processes, including thermal NIL, UV NIL, hot embossing, and Obducat’s patented STU® (Simultaneous Thermal & UV) process, enabling broader material compatibility and reduced cycle times.

The EITRE® 3 / 6 / 8 is highly configurable, with multiple UV module options delivering intensities from 50 to 400 mW/cm², optical alignment capabilities, and modular upgrades to support evolving R&D needs. The intuitive user interface and semi‑automated operation make the system easy to use while maintaining excellent process repeatability and flexibility.

Designed in accordance with European safety standards and carrying CE certification, the EITRE® platform is well suited for academic, institutional, and industrial R&D laboratories.