W2FF8NDE
Brand: Sentech
Category: Thin Film Metrology
Industry: Life Science and Biotechnology, Academia, Semiconductors, Material Science & Chemistry
The SENTECH Spectroscopic Ellipsometer are versatile and powerful tools that will provide precise and non-destructive characterisation of your thin films and surfaces, an essential tool for understanding and optimising the optical and structural properties of materials.
Spectroscopic Ellipsometry is a highly accurate and non-destructive optical technique used to analyze thin films, surfaces, and layered material structures. It has become an essential characterization method in advanced industries such as semiconductor manufacturing, nanotechnology, materials science, and microelectronics research. Because the technique is completely non-invasive, it allows researchers and engineers to study delicate samples without damaging or altering their properties.
The principle behind spectroscopic ellipsometry involves measuring the change in polarization of light when it reflects from a material surface. By analyzing these polarization changes across a wide spectral range, scientists can determine critical material parameters such as film thickness, refractive index, absorption coefficient, and other optical constants with extremely high precision.
One of the key advantages of spectroscopic ellipsometry is its ability to achieve sub-nanometer accuracy, making it ideal for the analysis of ultra-thin films and complex multilayer structures. Since the technique does not require direct contact with the sample, it ensures reliable, repeatable, and contamination-free measurements.
Labindia Instruments Pvt. Ltd. is the authorised dealer in India for Sentech, providing advanced thin film characterization solutions including spectroscopic ellipsometry systems. Through its partnership with Sentech, Labindia offers high-performance analytical instruments to support research laboratories, semiconductor facilities, and advanced material development across India.
Non-destructive, highly accurate thin-film characterization.
Broad spectral coverage — from deep UV to infrared.
Modular configuration for research, QA, or inline production.
Automated measurement and data analysis for high throughput.
Advanced modeling for multilayer and anisotropic materials.
Seamless integration into research or manufacturing workflows.
German-engineered precision and reliability.
Atomic-scale thin film measurement with sub-nanometer precision
Non-destructive and contact-free thin film characterization
Ideal for semiconductor thin film analysis and wafer research
Monitors thin film growth and deposition processes
Detects film thickness variations and uniformity issues
Supports analysis of multilayer structures and gate dielectrics
Suitable for metals, semiconductors, dielectrics, and organic layers
Enables real-time process monitoring and optimization
Delivers fast, repeatable, and highly accurate measurements
Essential for nanotechnology, photovoltaics, and microelectronics
Helps improve manufacturing yield and device reliability
Modular and flexible systems for research and small-scale production
Trusted SENTECH ellipsometry systems worldwide
User-friendly software and robust hardware design
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